Chen-Yu Chang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of mask fabrication, holding a total of 6 patents. His work focuses on improving manufacturing processes through innovative methods and systems.

Latest Patents

One of Chen-Yu Chang's latest patents is a method and system for mask fabrication process control. This method utilizes statistical process control analysis to enhance the efficiency and accuracy of mask production. A manufacturing model is defined, and a process run of a mask is performed as per this model. A fault detection analysis is conducted to minimize bias in the manufacturing model, and a fine-tuning signal is generated based on the results of this analysis. The process run operation is then adjusted according to the fine-tuning signal. Another notable patent involves a mask fabrication system that includes a processing tool, a metrology tool, and a controller. This system processes a mask and inspects it to obtain an inspection result, allowing for the generation and calibration of a manufacturing model based on various data inputs.

Career Highlights

Chen-Yu Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves leveraging his expertise in mask fabrication to drive advancements in manufacturing technology.

Collaborations

Throughout his career, Chen-Yu has collaborated with notable colleagues, including Chiech-Yi Kuo and Yuh-Fong Hwang. These partnerships have contributed to the development of innovative solutions in the field of semiconductor manufacturing.

Conclusion

Chen-Yu Chang's contributions to mask fabrication technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of manufacturing processes and a dedication to improving industry standards.

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