Company Filing History:
Years Active: 2014-2021
Title: Innovations by Inventor Chen-Hau Wu
Introduction
Chen-Hau Wu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photoresist technology, holding a total of 12 patents. His work focuses on improving the performance and efficiency of photoresist materials used in semiconductor manufacturing.
Latest Patents
Among his latest patents, Chen-Hau Wu has developed methods to reduce shrinkage and mass losses during photoresist exposure and post-exposure baking. His innovative approach involves utilizing a small group that decomposes, or alternatively, a bulky group that does not decompose. This combination can effectively enhance the stability of photoresist materials. Additionally, he incorporates polar functional groups to minimize the diffusion of reactants through the photoresist, further optimizing the manufacturing process.
Career Highlights
Chen-Hau Wu has established a successful career at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to push the boundaries of semiconductor technology. His expertise in photoresist materials has made him a valuable asset to the company and the industry as a whole.
Collaborations
Throughout his career, Chen-Hau Wu has collaborated with talented individuals such as Ching-Yu Chang and Wei-Han Lai. These partnerships have fostered innovation and contributed to the advancement of semiconductor technologies.
Conclusion
In summary, Chen-Hau Wu is a distinguished inventor whose work in photoresist technology has led to significant advancements in semiconductor manufacturing. His innovative methods and collaborations continue to shape the future of the industry.