Company Filing History:
5 out of 21,595 
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2 out of 1,361 
Years Active: 1976-2012
Title: The Innovations of Charles V Stancampiano
Introduction
Charles V Stancampiano is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of image sensor technology, holding a total of 8 patents. His work has been instrumental in advancing the capabilities of CMOS active pixel sensor cell structures.
Latest Patents
Stancampiano's latest patents include innovative methods for forming silicide strapping in imager transfer gate devices. One of his notable inventions is a CMOS active pixel sensor (APS) cell structure that features a dual workfunction transfer gate device. This device comprises a dielectric layer on a substrate and a dual workfunction gate conductor layer, which includes both a first and a second conductivity type doped region. The design allows for efficient charge transfer from a photosensing device to a diffusion region, with a silicide structure ensuring electrical coupling between the doped regions. Another significant patent focuses on methods for decreasing undesirable dark current in image sensor pixels. This method involves providing a photosensitive area that converts incident light into charge and utilizing a gate to transfer this charge while managing dark current effectively.
Career Highlights
Throughout his career, Stancampiano has worked with prominent companies such as Eastman Kodak Company and IBM. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in imaging and sensor design.
Collaborations
Stancampiano has collaborated with notable individuals in his field, including Edward T. Nelson and James William Adkisson. These partnerships have fostered innovation and have led to the development of advanced technologies in image sensing.
Conclusion
Charles V Stancampiano's contributions to the field of image sensor technology are significant and impactful. His innovative patents and collaborations highlight his expertise and dedication to advancing this important area of technology.