Taichung, Taiwan

Chao-Tzung Tsai


Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 33(Granted Patents)


Location History:

  • Hsin-Chu, TW (2005 - 2008)
  • Taichung, TW (2019 - 2021)

Company Filing History:


Years Active: 2005-2021

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6 patents (USPTO):

Title: Revolutionary Contributions of Inventor Chao-Tzung Tsai in Semiconductor Manufacturing

Introduction: Chao-Tzung Tsai is a notable inventor based in Taichung, Taiwan, renowned for his significant contributions to semiconductor manufacturing technology. With a total of six patents to his name, his innovations are at the forefront of advancing efficiency and reliability in semiconductor production.

Latest Patents: Among his latest patents, Chao-Tzung Tsai has developed groundbreaking semiconductor manufacturing apparatuses. One of his innovations features an air distributor within a chamber that comprises a first and second annular plate, which are intricately designed to enhance the gas flow for optimized semiconductor production. The apparatus includes ditches that connect to a gas through hole, allowing precise gas delivery to a hollow region, crucial for manufacturing processes.

In another notable patent, he introduced a semiconductor manufacturing apparatus that integrates an optical emission spectroscopy (OES) view port window. This apparatus employs an air distributor that creates an air curtain, effectively isolating the view port from the chamber's inner space, ensuring more accurate measurements and improving operational safety.

Career Highlights: Chao-Tzung Tsai's career is marked by his commitment to innovation in semiconductor technologies. His work at Taiwan Semiconductor Manufacturing Company Ltd. has positioned him as a key figure in the industry, where his inventions continue to influence manufacturing practices. With six patents granted, he showcases a blend of creativity and technical expertise that drives advancements in semiconductor reliability.

Collaborations: Throughout his career, Chao-Tzung Tsai has collaborated with esteemed colleagues, including Tzu Ken Lin and I-Chang Wu. These collaborations have allowed him to leverage diverse skills and insights, leading to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion: Chao-Tzung Tsai's contributions to semiconductor manufacturing underline the importance of innovation in technology. His patents reflect a pursuit of excellence and a dedication to improving manufacturing processes. As the industry evolves, the impact of his work will undoubtedly continue to resonate, fostering further innovations in semiconductor technology.

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