Company Filing History:
Years Active: 2004-2005
Title: Chao-Jung Chang: Innovator in Chemical Mechanical Polishing Technologies
Introduction
Chao-Jung Chang is a prominent inventor based in Yunghe, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patents. With a total of 4 patents, Chang has developed advanced systems and methods that enhance the efficiency and quality of CMP operations.
Latest Patents
One of his latest patents is the "Dual mode hybrid control and method for CMP slurry." This invention introduces a DMHC (dual mode hybrid control) system that improves the delivery of polishing slurry to CMP apparatuses. The system includes a linear table and a PID (proportional integrated differential) controller connected to a slurry pump, which ensures precise control over the polishing process. Additionally, a bubble trap and a flowmeter are integrated into the slurry flow conduit to monitor and optimize the slurry delivery.
Another notable patent is the "Method and system for in-situ monitoring of mixing ratio of high selectivity slurry." This invention focuses on monitoring the quality of slurry used in CMP operations. By utilizing a laser light source, the system can detect the slurry's quality and mixing ratio during the polishing process, ensuring optimal performance and results.
Career Highlights
Chao-Jung Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in CMP technologies. His work has significantly impacted the semiconductor manufacturing industry, contributing to advancements in polishing techniques and equipment.
Collaborations
Chang has collaborated with notable colleagues, including Ping-Hsu Chen and Jui-Cheng Lo. These partnerships have fostered innovation and development in CMP technologies, further enhancing the capabilities of the industry.
Conclusion
Chao-Jung Chang is a distinguished inventor whose work in chemical mechanical polishing has led to significant advancements in the field. His innovative patents and contributions continue to shape the future of semiconductor manufacturing.
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