The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Oct. 09, 2002
Ben-shu Chen, Taichung, TW;
Chao-jung Chang, Yunghe, TW;
Jui-cheng Lo, Hsinchu, TW;
Chin-hsin Peng, Hsinchu, TW;
Chien-kuo LU, Hsichu, TW;
Ben-Shu Chen, Taichung, TW;
Chao-Jung Chang, Yunghe, TW;
Jui-Cheng Lo, Hsinchu, TW;
Chin-Hsin Peng, Hsinchu, TW;
Chien-Kuo Lu, Hsichu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Abstract
A system for controlling and monitoring a rate of flow of a fluid, such as a CMP slurry, comprising a pump for pumping the slurry; a flow meter for monitoring the rate of flow of the slurry; and a controller operably connected to the flow meter and the pump. The controller receives signals from the flow meter indicating the rate of flow of the slurry and controls the operational speed of the pump responsive to the flow meter signals. A degasser equipped with a level sensor may be further provided in the system for removing gas bubbles from the slurry.