Taiwan Semiconductor Manufacturing Comp. Ltd.

Chao-Jung Chang

Ping-Hsu Chen

Syun-Ming Jang Jang

Yu-Liang Lin

Henry Lo

Ai-Sen Liu

Chien-Kuo Lu

Ping Chuang

Yu-Huei Chen

Jui-Cheng Lo

Chin-Hsin Peng

Shang-Ting Tsai

Chien-Ling Huang

Ben-Shu Chen

A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.

Dual mode hybrid control and method for CMP slurry

A method and system for monitoring the quality of a slurry utilized in a chemical mechanical polishing operation. A slurry is generally delivered through a tubular path during a chemical mechanical polishing operation. A laser light is generally transmitted from a laser light source, such that the laser light comes into contact with the slurry during the chemical mechanical polishing operation. The laser light can then be detected, after the laser light comes into contact with the slurry to thereby monitor the quality of the slurry utilized during the chemical mechanical polishing operation. The laser light that comes into contact with the slurry can be also be utilized to monitor a mixing ratio associated with the slurry.

Method and system for in-situ monitoring of mixing ratio of high selectivity slurry

A system for controlling and monitoring a rate of flow of a fluid, such as a CMP slurry, comprising a pump for pumping the slurry; a flow meter for monitoring the rate of flow of the slurry; and a controller operably connected to the flow meter and the pump. The controller receives signals from the flow meter indicating the rate of flow of the slurry and controls the operational speed of the pump responsive to the flow meter signals. A degasser equipped with a level sensor may be further provided in the system for removing gas bubbles from the slurry.

Slurry flow control and monitor system for chemical mechanical polisher

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Yunghe, Taiwan

Chao-Jung Chang