Chao-Chun Wang

Title: Innovations of Chao-Chun Wang

Introduction

Chao-Chun Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on improving integrated circuit structures and enhancing the performance of semiconductor devices.

Latest Patents

Among his latest patents, one notable invention is related to methods for reducing dual damascene distortion. This patent describes an integrated circuit structure that includes a first low-k dielectric layer and a second low-k dielectric layer with a lower k value. The second layer is positioned over the first, creating a dual damascene structure that optimizes interconnect performance. Another significant patent involves an interconnect structure with a dielectric cap layer and etch stop layer stack. This method outlines the formation of a semiconductor device, detailing the steps to create conductive features and protective layers that enhance device reliability.

Career Highlights

Chao-Chun Wang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Coretronic Corporation. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in semiconductor manufacturing.

Collaborations

Throughout his career, Wang has collaborated with notable colleagues such as Chung-Chi Ko and Po-Cheng Shih. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in