Chao-Chen Chen

Title: Innovations of Chao-Chen Chen in Semiconductor Technology

Introduction

Chao-Chen Chen is a prominent inventor based in Matou, Taiwan, known for his significant contributions to semiconductor technology. With a total of five patents to his name, he has developed innovative methods that enhance the structural stability and functionality of semiconductor features.

Latest Patents

One of his latest patents is titled "Metal filled semiconductor features with improved structural stability." This invention outlines a method for forming a metal-filled semiconductor feature that includes a semiconductor wafer with an anisotropically etched opening. The process involves multiple dielectric insulating layers and a preferential etching process that results in roughened sidewall surfaces, ultimately leading to a metal-filled feature. Another notable patent is the "Integrated process for fuse opening and passivation process for CU/LOW-K IMD." This invention provides a new process flow for creating a fuse contact and bond pad, utilizing a semiconductor substrate and various layers of insulation and passivation materials to enhance accessibility for fuse blowing.

Career Highlights

Chao-Chen Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing the technology used in modern electronic devices.

Collaborations

Chao-Chen has collaborated with notable coworkers such as Yi-Chen Huang and Wei-Kay Chiu, contributing to a dynamic team focused on semiconductor advancements.

Conclusion

Chao-Chen Chen's innovative patents and contributions to semiconductor technology highlight his role as a leading inventor in the field. His work not only enhances the structural integrity of semiconductor features but also paves the way for future advancements in electronic manufacturing.