Company Filing History:
Years Active: 2022-2025
Title: Chao Chang: Innovator in Metrology and CMOS Technology
Introduction
Chao Chang is a prominent inventor based in San Jose, CA, known for his contributions to the field of metrology and complementary metal-oxide-semiconductor (CMOS) technology. With a total of 6 patents to his name, he has made significant advancements that enhance measurement techniques in semiconductor manufacturing.
Latest Patents
Chao Chang's latest patents focus on innovative systems that utilize machine learning and physical modeling for metrology in the presence of CMOS under array (CuA) structures. One of his notable patents describes a system that includes a controller with processors designed to execute program instructions for implementing a measurement recipe. This involves generating a transformation model to convert full loop optical measurement data to short loop optical measurement data. The system aims to improve the accuracy of measurements for periodic memory array structures and CuA devices.
Another significant patent involves a system that classifies first structures of CuA devices into spatially-continuous regions based on unsupervised clustering. This patent emphasizes the development of effective medium models and measurement models to enhance the precision of metrology measurements for semiconductor devices.
Career Highlights
Chao Chang has established himself as a key figure in the semiconductor industry through his work at Kla Corporation. His expertise in metrology and CMOS technology has positioned him as a valuable asset in the development of advanced measurement systems.
Collaborations
Throughout his career, Chao has collaborated with notable colleagues, including Michael Friedmann and Jongjin Kim. These partnerships have contributed to the successful development of innovative technologies in the field.
Conclusion
Chao Chang's contributions to metrology and CMOS technology reflect his dedication to advancing measurement techniques in semiconductor manufacturing. His innovative patents and collaborative efforts continue to influence the industry positively.
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