The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Sep. 03, 2024
Kla Corporation, Milpitas, CA (US);
Amnon Manassen, Haifa, IL;
Kevin Peterlinz, Fremont, CA (US);
Andrew V. Hill, Berkley, CA (US);
Shankar Krishnan, Santa Clara, CA (US);
Yonatan Vaknin, Yoqneam Illit, IL;
Ido Dolev, Milpitas, CA (US);
Suryanarayanan Ganesan, Milpitas, CA (US);
Chao Chang, San Jose, CA (US);
Jongjin Kim, San Jose, CA (US);
David Zimdars, Ann Arbor, MI (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology system may include a dual frequency comb source providing a first comb beam with a first repetition rate and a second comb beam with a second repetition rate, a beamsplitter to generate one or more dual frequency comb illumination beams from the first comb beam and the second comb beam, and a beam combiner to form a dual frequency comb illumination beam from the first comb beam and the second comb beam. The system may further include an illumination sub-system to illuminate a sample with the dual frequency comb illumination beam through an objective lens, a collection sub-system to collect sample light from the sample with the objective lens, and a detector to capture a radio-frequency signal based on the sample light. The system may further extract spectral measurement data associated with the sample from the radio-frequency signal and generate metrology measurements based on the spectral measurement data.