The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Mar. 10, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Chao Chang, San Jose, CA (US);
Michael Friedmann, Mountain View, CA (US);
Assignee:
KLA CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); B01D 53/04 (2006.01); B01D 53/047 (2006.01); B01D 53/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); B01D 53/047 (2013.01); B01D 53/0462 (2013.01); B01D 53/22 (2013.01); B01D 2256/18 (2013.01); B01D 2259/45 (2013.01); F25J 2215/34 (2013.01); F25J 2215/36 (2013.01);
Abstract
A process chamber, such as for semiconductor processing equipment, is connected with a recovery unit. The recovery unit includes a first storage tank for buffer gas and a second storage tank for rare gas. Both storage tanks are connected with a column in the recovery unit. The recovery unit and process chamber can operate as a closed system. The rare gas can be transported at a variable flow rate while separation in the recovery unit operates at a constant flow condition.