Chang-Ming Dai

**Title: Innovations in Integrated Circuit Manufacturing by Chang-Ming Dai**

Introduction

Chang-Ming Dai, based in Hsinchu, Taiwan, is a prominent inventor known for his significant contributions to the field of integrated circuit (IC) manufacturing. With a remarkable portfolio comprising 22 patents, Dai has innovated processes that have advanced semiconductor technology, particularly in the sub-resolution era of IC fabrication.

Latest Patents

One of Dai's latest innovations is the patent titled "Full Sized Scattering Bar Alt-PSM Technique for IC Manufacturing in Sub-Resolution Era." This process focuses on shrinking gate lengths and poly interconnects simultaneously during IC fabrication. It involves coating a substrate with a positive tone photoresist, which is first exposed using an alternating phase shift mask featuring full-size scattering bars. These bars enable gate dimensions to be printed at approximately half the size of the exposing wavelength. Subsequently, the substrate is further exposed using a tritone attenuated phase shift mask. This method protects the shrunken gates while allowing for line interconnect shrinkage through areas with scattering bars that are not printed in the photoresist pattern. The described process offers higher depth of focus, lower optical proximity effects, and reduced sensitivity to lens aberrations, making it a substantial advancement over traditional lithography methods.

Career Highlights

Chang-Ming Dai has had a distinguished career, significantly impacting the semiconductor industry through his work at renowned institutions. He has been affiliated with the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company Limited, where he honed his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Dai has collaborated with esteemed professionals, including Chung-Hsing Chang and Jan-Wen You. These partnerships have facilitated innovative research and development in the field of IC manufacturing, leading to numerous advancements that benefit the industry.

Conclusion

Chang-Ming Dai continues to be a pivotal figure in the realm of integrated circuit manufacturing. His innovations, particularly the full-sized scattering bar alt-PSM technique, have set new benchmarks in semiconductor fabrication. With his extensive patent portfolio and collaborative efforts, Dai's contributions will surely influence the future of technology in this critical sector.