Chang Ming-Ching

Title: Chang Ming-Ching: Innovator in Integrated Circuit Technology

Introduction

Chang Ming-Ching is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology, holding a total of 2 patents. His innovative methods have advanced the way integrated circuits are formed, showcasing his expertise and creativity in this critical area of technology.

Latest Patents

Chang Ming-Ching's latest patents include a method of forming an integrated circuit using a patterned mask layer. This method involves creating a patterned mask layer on a material layer, which has a plurality of first features with a specific pitch. The process includes patterning the material layer using the mask, trimming the mask, and introducing dopants to form doped regions with a different pitch. Another patent he holds is a method of forming an integrated circuit that involves etching a second material layer using a patterned mask layer, followed by the introduction of dopants and selective removal of un-doped material to create second features.

Career Highlights

Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of semiconductor technology.

Collaborations

Throughout his career, Chang has collaborated with notable colleagues, including Tzu-Yen Hsieh and Chun-Hung Lee. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in integrated circuits.

Conclusion

Chang Ming-Ching is a distinguished inventor whose work in integrated circuit technology has made a lasting impact. His patents reflect his innovative spirit and dedication to advancing the field. His contributions continue to influence the semiconductor industry and inspire future innovations.