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For the Inventor, By the Inventor

Kaohsiung, Taiwan

Chang-Hong Ho

This inventor holds 10 USPTO granted patents and 3 published patent applications. Top assignee: Eternal Materials Co., Ltd.. Active years: 2020-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang-Hong Ho. Retrieved from https://idiyas.com/inventor/chang-hong-ho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 80.0

Average Co-Inventor Count = 5.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal10 out of 48 
 
Eternal Materials Co., Ltd.
 patents

Years Active: 2020-2022

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10 patents (USPTO):Explore Patents
1. 11353791 - Photosensitive dry film and uses of the same (2022-06-07),
2. 11319410 - Precursor for polyimide and use thereof (2022-05-03),
3. 11198792 - Method for preparing patterned coverlay on substrate (2021-12-14),
4. 11034797 - Polyimide precursor composition, use thereof and polyimide made therefrom (2021-06-15),
5. 10995179 - Polyimide resin and metal-clad laminate comprising the same (2021-05-04),
6. 10731004 - Polyimide precursor composition and use thereof (2020-08-04),
7. 10696793 - Process for preparing polyimides (2020-06-30),
8. 10639876 - Solvent-containing dry film and method for applying the same on a substrate (2020-05-05),
9. 10626220 - Precursor for polyimide and use thereof (2020-04-21),
10. 10590305 - Polyimide dry film and application thereof (2020-03-17),

Title: Innovations of Chang-Hong Ho: Advancements in Photosensitive Materials

Introduction

Chang-Hong Ho, a prominent inventor based in Kaohsiung, Taiwan, has made significant contributions to the field of materials science with ten patents to his name. His innovative work focuses on developing advanced materials that serve various applications in industry, particularly in the realm of photosensitive technologies.

Latest Patents

Among his latest inventions, Ho has created a photosensitive dry film and methods for its use. This innovative photosensitive dry film consists of a support layer and a photosensitive resin layer situated on top. The support layer features a first surface that contacts the resin layer and a second, opposing surface, with the distinct characteristic of a non-smooth texture. Another notable patent is related to the precursor for polyimide, where he introduced an amic acid ester oligomer encapsulated in a specific structural formula. These patents illustrate his commitment to enhancing the functionality and applicability of photosensitive materials.

Career Highlights

Ho’s impactful career at Eternal Materials Co., Ltd. has positioned him as a key player in advancing material technology. His research and innovations have not only expanded the company's portfolio but have also contributed to wider applications across various industries. His expertise in the development of photosensitive materials has garnered recognition in the field, establishing him as a notable inventor in this niche.

Collaborations

Throughout his career, Chang-Hong Ho has collaborated with esteemed colleagues like Chung-Jen Wu and Po-Yu Huang. Together, they have fostered a dynamic environment for innovation at Eternal Materials Co., Ltd., leading to groundbreaking advancements in materials science. Their joint efforts have been instrumental in pushing the boundaries of technology and improving the quality of products utilizing photosensitive materials.

Conclusion

Chang-Hong Ho's journey as an inventor showcases the power of innovation in the realm of materials science. Through his latest patents and collaborative efforts, he continues to pave the way for advancements that hold promise for multiple industries. His contributions emphasize the important role inventors play in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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