Chang Hee Han

Title: Innovations by Chang Hee Han

Introduction

Chang Hee Han is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of substrate processing and thin film technology. With a total of two patents to his name, his work reflects a commitment to advancing technological solutions in his industry.

Latest Patents

Chang Hee Han's latest patents include a substrate processing apparatus and a method for forming thin films. The substrate processing apparatus features a process chamber designed for substrate processing, a substrate support with a susceptor that has pocket grooves, and a gas injection unit for delivering process gas. This innovative design enhances the efficiency of substrate processing. The method for forming thin films involves creating a first thin film through atomic layer deposition and subsequently etching it to form a second thin film with reduced thickness. This method showcases his expertise in precision manufacturing techniques.

Career Highlights

Chang Hee Han is currently employed at Wonik Ips Co., Ltd., where he continues to develop cutting-edge technologies. His work has positioned him as a key figure in the field of substrate processing and thin film formation. His contributions are recognized for their impact on improving manufacturing processes.

Collaborations

Chang Hee Han collaborates with talented colleagues, including Woo Young Park and Ja Hyun Koo. Their teamwork fosters an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Chang Hee Han's contributions to substrate processing and thin film technology highlight his role as an influential inventor. His patents reflect a dedication to innovation and excellence in engineering.