The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2022
Filed:
Dec. 09, 2020
Wonik Ips Co., Ltd., Pyeongtaek-si, KR;
Woo Young Park, Anyang-si, KR;
Ja Hyun Koo, Yongin-si, KR;
Chang Hee Han, Pyeongtaek-si, KR;
Sung Eun Lee, Osan-si, KR;
Sung Ho Jeon, Seosan-si, KR;
Byoung Guk Son, Osan-si, KR;
Sung Ho Roh, Yongin-si, KR;
Yeong Taek Oh, Osan-si, KR;
WONIK IPS CO., LTD., Pyeongtaek-si, KR;
Abstract
The present invention provides a substrate processing apparatus including: a process chamber having a process space in which a substrate is processed; a substrate support including a susceptor having a plurality of pocket grooves recessed in a circumferential direction from a top surface with a circular plate shape so that the substrate is seated, a shaft configured to rotate the susceptor, and a satellite seated in the pocket groove and on which the substrate is seated; and a gas injection unit disposed at an upper portion of the process chamber to face the substrate support, thereby injecting a process gas toward the substrate support.