Osan, South Korea

Yeong Taek Oh

This inventor holds 1 USPTO granted patent. Top assignee: Wonik Ips Co., Ltd.. Active years: 2022.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yeong Taek Oh - Innovator in Substrate Processing Technology

Introduction

Yeong Taek Oh is a notable inventor based in Osan-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Yeong Taek Oh holds a patent for a substrate processing apparatus. This invention includes a process chamber with a process space designed for substrate processing. The apparatus features a substrate support that includes a susceptor with multiple pocket grooves, allowing for effective seating of the substrate. Additionally, it has a shaft for rotating the susceptor and a satellite that sits in the pocket groove, supporting the substrate. A gas injection unit is positioned above the process chamber to direct process gas toward the substrate support. This innovative design aims to improve the overall processing of substrates.

Career Highlights

Yeong Taek Oh is associated with Wonik Ips Co., Ltd., where he continues to develop and refine his inventions. His work has been instrumental in advancing substrate processing technologies, making significant impacts in the industry.

Collaborations

He collaborates with talented coworkers, including Woo Young Park and Ja Hyun Koo, who contribute to the innovative environment at Wonik Ips Co., Ltd.

Conclusion

Yeong Taek Oh's contributions to substrate processing technology exemplify his dedication to innovation and excellence in his field. His patent for the substrate processing apparatus showcases his ability to create solutions that enhance efficiency and effectiveness in substrate processing.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…