Location History:
- Peabody, MA (US) (1980)
- Danvers, MA (US) (1981 - 2017)
- Nashua, NH (US) (2011 - 2017)
Company Filing History:
11 out of 24 
3 out of 72 
2 out of 3 Years Active: 1980-2017
Title: Innovations and Contributions of Chandra P Khattak
Introduction
Chandra P Khattak is a notable inventor based in Danvers, MA, with a remarkable portfolio of 18 patents. His work primarily focuses on advancements in chemical vapor deposition (CVD) processes and crystal growth apparatuses, contributing significantly to the field of materials science.
Latest Patents
One of Khattak's latest patents involves an innovative method for increasing polysilicon deposition in a CVD reactor. This process replaces conventional silicon 'slim rods' with shaped silicon filaments that have larger surface areas, such as silicon tubes and ribbons. By utilizing these filaments, the production rate of silicon deposits is enhanced without altering the reactor size or increasing the number of filaments. Additionally, he has developed a method for preventing molten material breaches in crystal growth apparatuses by coating the chamber with a ceramic material. This innovation minimizes hazards and production costs while ensuring high-quality crystalline products.
Career Highlights
Throughout his career, Khattak has worked with prominent companies such as Crystal Systems Corporation and GTAT Corporation. His contributions have been pivotal in advancing technologies related to silicon production and crystal growth.
Collaborations
Khattak has collaborated with esteemed colleagues, including Frederick Schmid and Maynard B Smith, further enhancing the impact of his work in the industry.
Conclusion
Chandra P Khattak's innovative approaches and significant contributions to the field of materials science underscore his status as a leading inventor. His advancements in polysilicon deposition and crystal growth technologies continue to influence the industry positively.