Chan Loong Neo

Title: Chan Loong Neo: Innovator in Plasma Dicing Technology

Introduction

Chan Loong Neo is a notable inventor based in Singapore, SG. He has made significant contributions to the field of plasma dicing technology, particularly with his innovative approach to wafer singulation. His work is characterized by a focus on enhancing the efficiency and effectiveness of plasma etching processes.

Latest Patents

Chan Loong Neo holds a patent for a "Frame mask for singulating wafers by plasma etching." This patent relates to the plasma dicing of wafers and introduces a novel frame mask design. The frame mask includes a mask frame with a top ring mask support and a side ring mask support. It features a plurality of mask segments that are suspended from the top ring mask support, which are configured to define dicing channels on a blank wafer. The design allows for the mask to sit removably onto a frame lift assembly in a plasma chamber, enabling efficient plasma dicing of the wafer.

Career Highlights

Chan Loong Neo is currently employed at Utac Headquarters Pte. Ltd., where he continues to develop and refine his innovative technologies. His work has positioned him as a key player in the advancement of plasma dicing methods, contributing to the overall progress in semiconductor manufacturing.

Collaborations

Throughout his career, Chan has collaborated with talented individuals such as Dzafir Bin Mohd Shariff and Il Kwon Shim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Chan Loong Neo's contributions to plasma dicing technology exemplify the spirit of innovation in the semiconductor industry. His patent and ongoing work at Utac Headquarters Pte. Ltd. highlight his commitment to advancing technology in this critical field.