Kofu, Japan

Chaeho Kim

This inventor holds 4 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2008-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chaeho Kim. Retrieved from https://idiyas.com/inventor/chaeho-kim-ihz96nle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 166(Granted Patents)


Location History:

  • Yongin, JP (2010)
  • Kofu, JP (2008 - 2011)
  • Suwon, KR (2013)

Company Filing History:


Years Active: 2008-2013

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4 patents (USPTO):Explore Patents

Title: Chaeho Kim: Innovator in Semiconductor Technology

Introduction

Chaeho Kim is a prominent inventor based in Kofu, Japan, known for his contributions to semiconductor technology. With a total of 4 patents to his name, he has made significant advancements in film formation methods and apparatuses used in semiconductor processes.

Latest Patents

One of his latest patents is a film formation method and apparatus for semiconductor processes. This innovative apparatus includes a process gas supply system designed to supply process gases effectively. The system features a gas mixture tank that mixes first and third process gases to create a mixture gas. Additionally, it has a mixture gas supply line that transports the mixture gas from the tank to the process field. The apparatus also includes a second process gas supply circuit, which allows for the supply of a second process gas directly to the process field without passing through the gas mixture tank. The control section of the apparatus manages the first and second switching valves to alternately and pulse-wise supply the mixture gas and the second process gas to the process field.

Another notable patent by Chaeho Kim is a film formation apparatus and method for semiconductor processes. This apparatus includes a source gas supply circuit that delivers a source gas into a process container for depositing a thin film on target substrates. It also features a mixture gas supply circuit that introduces a mixture gas containing a doping gas and a dilution gas into the process container. The gas mixture tank, located outside the process container, mixes the doping gas with the dilution gas to form the mixture gas, which is then supplied into the process container.

Career Highlights

Chaeho Kim is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Chaeho Kim has collaborated with notable colleagues, including Kazuhide Hasebe and Pao-Hwa Chou. These collaborations have contributed to the innovative advancements in semiconductor technology.

Conclusion

Chaeho Kim's contributions to semiconductor technology through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His advancements in film formation methods and apparatuses continue to influence the semiconductor industry significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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