The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Jul. 03, 2008
Kazuhide Hasebe, Minamialps, JP;
Mitsuhiro Okada, Kai, JP;
Chaeho Kim, Suwon, KR;
Byounghoon Lee, Yongin, KR;
Pao-hwa Chou, Kai, JP;
Kazuhide Hasebe, Minamialps, JP;
Mitsuhiro Okada, Kai, JP;
Chaeho Kim, Suwon, KR;
Byounghoon Lee, Yongin, KR;
Pao-Hwa Chou, Kai, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film formation apparatus for a semiconductor process includes a process gas supply system configured to supply process gases. The process gas supply system includes a gas mixture tank configured to mix first and third process gases to form a mixture gas, a mixture gas supply line configured to supply the mixture gas from the gas mixture tank to a process field, a second process gas supply circuit having a second process gas supply line configured to supply a second process gas to the process field without passing through the gas mixture tank, and first and second switching valves disposed on the mixture gas supply line and the second process gas supply line, respectively. A control section controls the first and second switching valves to be opened and closed so as to alternately and pulse-wise supply the mixture gas and the second process gas to the process field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile