Grenoble, France

Cécile Berne


Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2005-2008

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Cecile Berne: Innovator in Semiconductor Manufacturing

Introduction

Cecile Berne is a prominent inventor based in Grenoble, France. She has made significant contributions to the field of semiconductor manufacturing, particularly through her innovative methods. Her work has led to advancements that enhance the efficiency and effectiveness of semiconductor substrates.

Latest Patents

Cecile Berne holds a patent for a two-stage annealing method for manufacturing semiconductor substrates. This invention relates to a method for creating a heterogeneous material structure. The process involves forming a predetermined detachment area in a source substrate and bonding it to a handle substrate to create a source-handle structure. The structure is then annealed at a first energy level that is lower than the energy of a thermal detachment budget, stopping before the source substrate detaches. Finally, the source-handle structure is annealed at a second energy level, which is lower than the first, until the substrate detaches at the predetermined area. This innovative approach has the potential to improve the manufacturing process of semiconductor devices.

Career Highlights

Throughout her career, Cecile Berne has worked with notable companies in the semiconductor industry. She has been associated with S.O.I. Tec Silicon on Insulator Technologies, S.A. and the Commissariat à l'énergie atomique (CEA). Her experience in these organizations has contributed to her expertise and the development of her patented technologies.

Collaborations

Cecile has collaborated with esteemed colleagues such as Bruno Ghyselen and Chrystelle Lagahe. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of semiconductor technology.

Conclusion

Cecile Berne is a trailblazer in the semiconductor manufacturing industry, with her innovative two-stage annealing method showcasing her expertise. Her contributions continue to influence the field, paving the way for future advancements in semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…