The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Dec. 10, 2003
Cecile Berne, Grenoble, FR;
Bruno Ghyselen, Seyssinet-Pariset, FR;
Chrystelle Lagahe, St Joseph de Rivière, FR;
Thibaut Maurice, Grenoble, FR;
Cecile Berne, Grenoble, FR;
Bruno Ghyselen, Seyssinet-Pariset, FR;
Chrystelle Lagahe, St Joseph de Rivière, FR;
Thibaut Maurice, Grenoble, FR;
S.O.I.Tec Silicon on Insulator Technologies S.A., Bernin, FR;
Commisariat à l'énergie Atomique (CEA), Paris, FR;
Abstract
The present invention relates to a method for manufacturing a heterogeneous material structure. The method includes forming a predetermined detachment area in a source substrate, and bonding the source substrate to a handle substrate to form a source-handle structure. The source-handle-structure is then annealed at a first energy level that is lower than the energy of a thermal detachment budget and stopping before detachment of the source substrate. Lastly, the source-handle-structure is annealed at a second energy level that is lower than the first energy level at least until the substrate detaches at the predetermined detachment area.