Hsinchu, Taiwan

C C Chang

USPTO Granted Patents = 9 

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Taipei, TW (1990)
  • Chu-Ton, TW (1999)
  • Hsinchu, TW (2019 - 2024)

Company Filing History:


Years Active: 1990-2025

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9 patents (USPTO):

Title: C C Chang: Innovator in Semiconductor Technology

Introduction

C C Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work has been instrumental in advancing the capabilities of semiconductor devices.

Latest Patents

C C Chang's latest patents include innovations in semiconductor devices featuring passivation layers. One of his patents describes a semiconductor device that includes a conductive pad over an interconnect structure, which is electrically connected to an active device. This device also features a dielectric layer over the conductive pad, with the dielectric layer exhibiting a first conformity. Additionally, the semiconductor device includes a passivation layer over the dielectric layer, which has a second conformity that differs from the first. Another patent elaborates on a similar concept, emphasizing the importance of the passivation layer in enhancing device performance.

Career Highlights

Throughout his career, C C Chang has worked with notable companies, including Taiwan Semiconductor Manufacturing Company Limited. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to various advancements and innovations.

Collaborations

C C Chang has collaborated with esteemed colleagues such as Yu-Lung Shih and Alan Kuo. These partnerships have fostered a collaborative environment that has led to significant technological advancements in semiconductor devices.

Conclusion

C C Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry, paving the way for future innovations.

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