Midland, MI, United States of America

Byung Keun Hwang

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 51(Granted Patents)


Location History:

  • Midland, MI (US) (2003 - 2023)
  • Wilmington, DE (US) (2023)

Company Filing History:


Years Active: 2003-2023

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10 patents (USPTO):Explore Patents

Title: Byung Keun Hwang: Innovator in Silane Compounds

Introduction

Byung Keun Hwang is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of silane compounds, holding a total of 10 patents. His work has advanced the understanding and application of these compounds in various industries.

Latest Patents

Hwang's latest patents include innovative methods for preparing 1,1,1-tris(organoamino)disilane compounds. This patent discloses a method that involves aminating a 1,1,1-trihalodisilane with an organoamine compound. The resulting reaction product is the 1,1,1-tris(organoamino)disilane compound, which can be used in a film-forming composition. Additionally, he has developed a method for forming films on substrates using thio(di)silanes through chemical vapor deposition (CVD) or atomic layer deposition (ALD) processes.

Career Highlights

Throughout his career, Byung Keun Hwang has worked with prominent companies such as Dow Corning Corporation and Dow Silicones Corporation. His experience in these organizations has allowed him to refine his expertise in silane technology and contribute to various innovative projects.

Collaborations

Hwang has collaborated with notable colleagues, including Xiaobing Zhou and Brian David Rekken. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Byung Keun Hwang's contributions to the field of silane compounds and his impressive portfolio of patents highlight his role as a leading inventor. His work continues to influence advancements in material science and technology.

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