Gyeonggi-do, South Korea

Byung-Am Lee

This inventor holds 4 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2006-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung-Am Lee. Retrieved from https://idiyas.com/inventor/byung-am-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.3

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Suwon-si, KR (2006 - 2007)
  • Gyeonggi-do, KR (2007 - 2008)

Company Filing History:


Years Active: 2006-2008

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4 patents (USPTO):Explore Patents

Title: Byung-Am Lee: Innovator in Substrate Technology

Introduction

Byung-Am Lee is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate technology, holding a total of 4 patents. His work focuses on methods and apparatuses that enhance the efficiency and accuracy of substrate processing.

Latest Patents

One of his latest patents is titled "Method and apparatus for classifying repetitive defects on a substrate." This invention provides a systematic approach to identifying and classifying defects on dies by comparing them with a predetermined reference die. The method involves marking sets of coordinates on the reference die that correspond to the positions of defects, allowing for the classification of repetitive defects in specified regions.

Another notable patent is the "Method for aligning a wafer and apparatus for performing the same." This innovation enables precise and rapid alignment of wafers, even when the wafers have different images. By forming a template pattern based on the image data of the first wafer, the method allows for the transformation of this pattern to align a second wafer, thereby streamlining the alignment process.

Career Highlights

Byung-Am Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to develop innovative solutions in substrate technology. His work has significantly impacted the efficiency of manufacturing processes in the electronics industry.

Collaborations

He collaborates with talented coworkers, including Chang-Hoon Lee and Byung-Seol Ahn, who contribute to the advancement of their projects and innovations.

Conclusion

Byung-Am Lee's contributions to substrate technology through his patents demonstrate his commitment to innovation and excellence in the field. His work continues to influence the industry, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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