Byoung Ha Cho

Title: Byoung Ha Cho: Innovator in Substrate Processing Technology

Introduction

Byoung Ha Cho is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 4 patents. His innovative work focuses on improving gas supply apparatuses and substrate treatment methods.

Latest Patents

One of his latest patents is a gas supply apparatus for substrate processing apparatuses. This inventive concept includes a first supply line connected to a first gas spray unit, along with multiple first gas supply devices linked to the first supply line. It also features a first measurement device that measures pressure at the first supply line, ensuring that the pressure remains within a specified reference value. Another significant patent is for an apparatus and method for treating substrates. This technology allows for the sequential or repetitive execution of thin film deposition and surface treatment processes within a single process space. The apparatus includes a process chamber, a substrate supporter, and a gas distributor that spatially separates and distributes process gases effectively.

Career Highlights

Throughout his career, Byoung Ha Cho has worked with prominent companies such as Jusung Engineering Co., Ltd. and Samsung Electronics Co., Ltd. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

He has collaborated with notable colleagues, including Cheol Ho Shin and Won Hyung Lee. Their combined efforts have further advanced the field of substrate processing.

Conclusion

Byoung Ha Cho's innovative contributions to substrate processing technology demonstrate his commitment to advancing this field. His patents reflect a deep understanding of the complexities involved in gas supply and substrate treatment processes.