The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Jan. 12, 2022
Jusung Engineering Co., Ltd., Gwangju-si, KR;
Se Whan Jin, Gwangju-si, KR;
Jae Sung Roh, Gwangju-si, KR;
Hong Min Yoon, Gwangju-si, KR;
Hong Soo Yoon, Gwangju-si, KR;
Youn Joo Jang, Gwangju-si, KR;
Byoung Ha Cho, Gwangju-si, KR;
Ji Hyun Cho, Gwangju-si, KR;
Chul Joo Hwang, Gwangju-si, KR;
JUSUNG ENGINEERING CO., LTD., , KR;
Abstract
The present inventive concept relates to a gas supply apparatus for a substrate processing apparatus, the gas supply apparatus comprising: a first supply line connected to a first gas spray unit; a plurality of first gas supply devices connected to the first supply line; a first measurement device measuring a first pressure at the first supply line; a second supply line connected to a second gas spray unit; a plurality of second gas supply devices connected to the second supply line; and a second measurement device measuring a second pressure at the second supply line, wherein the first measurement device checks if the first pressure deviates from a first reference value, and the second measurement device checks if the second pressure deviates from a second reference value.