Pleasanton, CA, United States of America

Byeong Chan Lee

USPTO Granted Patents = 7 

Average Co-Inventor Count = 2.9

ph-index = 1


Company Filing History:


Years Active: 2021-2025

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7 patents (USPTO):Explore Patents

Title: Innovations by Byeong Chan Lee

Introduction

Byeong Chan Lee is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on improving the efficiency and quality of semiconductor devices.

Latest Patents

One of his latest patents is titled "Void-free contact trench fill in gate-all-around FET architecture." This patent describes a method of forming a contact trench structure in a semiconductor device. The method includes performing a first selective deposition process to form a contact on the sidewalls of a trench, which comprises different materials. Additionally, it involves a second selective deposition process to create a metal silicide layer on the contact, followed by a series of metal fill processes to ensure the integrity of the contact plug within the trench.

Another notable patent is "System and methods for DRAM contact formation." This patent relates to dynamic random access memory (DRAM) devices and semiconductor fabrication. It provides an integrated processing system and methods for forming CMOS contacts, DRAM array bit line contacts, and storage node structures. The innovations disclosed aim to reduce contamination and improve quality, thereby minimizing leakage current and resistance in the final structures.

Career Highlights

Byeong Chan Lee is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His expertise and innovative approaches have positioned him as a key figure in advancing semiconductor technologies.

Collaborations

He has collaborated with notable coworkers, including Benjamin Colombeau and Nicolas L Breil, contributing to various projects and innovations in the field.

Conclusion

Byeong Chan Lee's work exemplifies the spirit of innovation in semiconductor technology. His patents reflect a commitment to enhancing device performance and reliability. His contributions continue to influence the industry positively.

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