Tampa, FL, United States of America

Burn J Lin


Average Co-Inventor Count = 1.5

ph-index = 16

Forward Citations = 840(Granted Patents)


Location History:

  • Shrub Oak, NY (US) (1976)
  • Somers, NY (US) (1977)
  • Katonah, NY (US) (1979 - 1984)
  • Scarsdale, NY (US) (1985 - 1995)
  • Austin, TX (US) (1993 - 1995)
  • Tampa, FL (US) (1995 - 1998)

Company Filing History:


Years Active: 1976-1998

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23 patents (USPTO):

Title: The Innovative Contributions of Burn J Lin

Introduction

Burn J Lin is a notable inventor based in Tampa, Florida, with an impressive portfolio of 23 patents. His contributions primarily focus on advancements in photolithography processes and semiconductor technology, reflecting his commitment to innovation in the field.

Latest Patents

Among his latest patents, Burn J Lin has developed a "Simple Repair Method for Phase Shifting Masks," which addresses the complexities of defect correction in phase-shift masks used in photolithography. This unique method involves creating a second repair mask with phase shifters, making adjacent regions opaque around existing defects. By copying the design circuitry from the defective regions onto the second mask, this invention offers a cost-effective solution to a challenging problem.

Another significant patent is for a "Step and Repeat Apparatus Having Enhanced Accuracy and Increased" which is a multi-station Step and Repeat Apparatus (Stepper) designed for imaging semiconductor wafers. This innovative stepper includes at least two stations; one for imaging and the other for image field characterization or defect correction. It features multiple laser beams aligned in orthogonal directions to allow for interferometric monitoring, enhancing precision in wafer tracking.

Career Highlights

Burn J Lin's career includes substantial experience working with prestigious organizations, notably IBM. His time at this global technology and consulting company has enriched his expertise and professional network in the field of semiconductor technology.

Collaborations

Throughout his career, Burn J Lin has collaborated with talented professionals, including coworkers Constantino Lapadula and Thomas J Cardinali. Their combined efforts in research and development have contributed significantly to the innovation landscape within their field.

Conclusion

Burn J Lin's work exemplifies the spirit of innovation, particularly in the realm of semiconductor technologies. His patented inventions not only solve complex industry challenges but also pave the way for further advancements in photolithography and imaging techniques. As he continues to push the boundaries of technology, his contributions are sure to leave a lasting impact on the field.

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