Burn J Lin

This inventor holds 23 USPTO granted patents, primarily in Photolithography Techniques. Top assignees: International Business Machines Corporation, Other. Active years: 1976-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Burn J Lin. Retrieved from https://idiyas.com/inventor/burn-j-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23

% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 16

Forward Citations = 842(Granted Patents)

Location History:

Shrub Oak, NY (US) (1976)
Somers, NY (US) (1977)
Katonah, NY (US) (1979 - 1984)
Scarsdale, NY (US) (1985 - 1995)
Austin, TX (US) (1993 - 1995)
Tampa, FL (US) (1995 - 1998)

Company Filing History:

22 out of 166,351

International Business Machines Corporation

patents

1 out of 834,513

Other

patents

Years Active: 1976-1998

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Areas of Expertise:

Phase Shifting Masks

Resist Coating

Photolithography

Image Quality Enhancement

Optical Projection Printing

Material-Saving Techniques

Real-Time Monitoring

Dynamic Magnetic Bubble Display

Patterned Resist

Inspection Methods

High-Throughput Processes

Mask Structures

23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 5795685 - Simple repair method for phase shifting masks (1998-08-18),

2. 5715064 - Step and repeat apparatus having enhanced accuracy and increased (1998-02-03),

3. 5571560 - Proximity-dispensing high-throughput low-consumption resist coating (1996-11-05),

4. 5565286 - Combined attenuated-alternating phase shifting mask structure and (1996-10-15),

5. 5523186 - Split and cover technique for phase shifting photolithography (1996-06-04),

6. 5472814 - Orthogonally separated phase shifted and unphase shifted mask patterns (1995-12-05),

7. 5449405 - Material-saving resist spinner and process (1995-09-12),

8. 5446540 - Method of inspecting phase shift masks employing phase-error enhancing (1995-08-29),

9. 5403682 - Alternating rim phase-shifting mask (1995-04-04),

10. 5378511 - Material-saving resist spinner and process (1995-01-03),

11. 5366757 - In situ resist control during spray and spin in vapor (1994-11-22),

12. 5288569 - Feature biassing and absorptive phase-shifting techniques to improve (1994-02-22),

13. 5272024 - Mask-structure and process to repair missing or unwanted phase-shifting (1993-12-21),

14. 4902899 - Lithographic process having improved image quality (1990-02-20),

15. 4737425 - Patterned resist and process (1988-04-12),

Title: The Innovative Contributions of Burn J Lin

Introduction

Burn J Lin is a notable inventor based in Tampa, Florida, with an impressive portfolio of 23 patents. His contributions primarily focus on advancements in photolithography processes and semiconductor technology, reflecting his commitment to innovation in the field.

Latest Patents

Among his latest patents, Burn J Lin has developed a "Simple Repair Method for Phase Shifting Masks," which addresses the complexities of defect correction in phase-shift masks used in photolithography. This unique method involves creating a second repair mask with phase shifters, making adjacent regions opaque around existing defects. By copying the design circuitry from the defective regions onto the second mask, this invention offers a cost-effective solution to a challenging problem.

Another significant patent is for a "Step and Repeat Apparatus Having Enhanced Accuracy and Increased" which is a multi-station Step and Repeat Apparatus (Stepper) designed for imaging semiconductor wafers. This innovative stepper includes at least two stations; one for imaging and the other for image field characterization or defect correction. It features multiple laser beams aligned in orthogonal directions to allow for interferometric monitoring, enhancing precision in wafer tracking.

Career Highlights

Burn J Lin's career includes substantial experience working with prestigious organizations, notably IBM. His time at this global technology and consulting company has enriched his expertise and professional network in the field of semiconductor technology.

Collaborations

Throughout his career, Burn J Lin has collaborated with talented professionals, including coworkers Constantino Lapadula and Thomas J Cardinali. Their combined efforts in research and development have contributed significantly to the innovation landscape within their field.

Conclusion

Burn J Lin's work exemplifies the spirit of innovation, particularly in the realm of semiconductor technologies. His patented inventions not only solve complex industry challenges but also pave the way for further advancements in photolithography and imaging techniques. As he continues to push the boundaries of technology, his contributions are sure to leave a lasting impact on the field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]