The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1998
Filed:
Jun. 17, 1994
Applicant:
Inventor:
Burn Jeng Lin, Tampa, FL (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ; 356375 ; 355 53 ;
Abstract
A multi-station Step and Repeat Apparatus (Stepper) for imaging semiconductor wafers. The stepper has at least 2 stations, at least one of which is for imaging. The second station may be used for image field characterization, or image defect correction, or for Phase Shift Mask (PSM) loop cutting. Multiple laser beams directed in orthogonal directions provide interferometric monitoring to track wafer locations for wafers on the stepper.