The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 1995
Filed:
Nov. 17, 1994
Applicant:
Inventor:
Burn J Lin, Tampa, FL (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430323 ; 430324 ; 430394 ;
Abstract
A structure and fabrication method for an alternating-element phase-shifting mask (Alt PSM) wherein all the mask pattern components extending in a first direction, such as the x direction are formed on a first mask substrate and all the mask pattern components extending in a second direction orthogonal to the first direction, such as the y direction, are formed on a second mask substrate. The two mask substrates are either combined together in a single mask for a single exposure step on a wafer, or separate exposures may be made through each mask and superimposed on a single wafer.