Brian Ahr

Title: The Innovative Contributions of Brian Ahr

Introduction

Brian Ahr is a notable inventor based in San Jose, California, with a remarkable portfolio of seven patents. His work primarily focuses on advancements in light source technologies, particularly in the field of extreme ultraviolet (EUV) lithography.

Latest Patents

One of Ahr's latest patents is titled "Confocal Chromatic Metrology for EUV Source Condition Monitoring." This invention features a light source that includes a rotatable drum coated with xenon ice, which is illuminated by a laser beam to produce plasma. The design incorporates a confocal chromatic sensor that measures distances from the sensor to the drum, ensuring precise monitoring. The sensor head is designed to focus light onto the drum and detect reflected light, all within a vacuum chamber.

Another significant patent is "Laser Produced Plasma Light Source Having a Target Material Coated on a Cylindrically-Symmetric Element." This invention addresses the challenges of laser-produced plasma light sources by utilizing a target material, such as xenon, coated on the drum's outer surface. The design includes bearing systems that minimize the leakage of contaminants into the LPP chamber, along with injection systems for coating and replenishing the target material. Additionally, wiper systems are implemented to prepare the target material surface, ensuring optimal performance.

Career Highlights

Brian Ahr has made significant contributions to the field through his work at Kla Corporation and KLA-Tencor Corporation. His experience in these companies has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of light source technologies.

Collaborations

Throughout his career, Ahr has collaborated with talented individuals such as Oleg Khodykin and Rudy Flores Garcia. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their respective fields.

Conclusion

Brian Ahr's innovative contributions to light source technology and his impressive patent portfolio highlight his role as a leading inventor in the industry. His work continues to influence advancements in EUV lithography and related technologies.