The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Jul. 18, 2014
Kla-tencor Corporation, Milpitas, CA (US);
Alexander Bykanov, San Diego, CA (US);
Oleg Khodykin, San Diego, CA (US);
Daniel C. Wack, Fredericksburg, VA (US);
Konstantin Tsigutkin, San Diego, CA (US);
Layton Hale, Castro Valley, CA (US);
Joseph Walsh, Soquel, CA (US);
Frank Chilese, San Ramon, CA (US);
Rudy F. Garcia, Union City, CA (US);
Brian Ahr, San Jose, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.