Company Filing History:
Years Active: 2024-2025
Title: The Innovative Contributions of Brandon Michael Johnson
Introduction
Brandon Michael Johnson is a notable inventor based in Escondido, California. He has made significant contributions to the field of droplet generation technology, particularly in the context of lithographic radiation systems. With a total of 2 patents, Johnson's work is at the forefront of innovation in this specialized area.
Latest Patents
Johnson's latest patents include a hybrid droplet generator designed for extreme ultraviolet light sources in lithographic radiation systems. This innovative droplet generator nozzle features a metal body and a metal fitting arranged adjacent to the body. The design incorporates a capillary that ejects initial droplets of material, with an electromechanical element that applies changes affecting droplet generation. Additionally, he has developed a method for manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source, which involves a glass capillary forming a direct glass-to-metal seal with a metal fitting.
Career Highlights
Brandon Michael Johnson is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work there focuses on advancing technologies that are crucial for the production of integrated circuits. Johnson's expertise in droplet generation has positioned him as a key player in the development of next-generation lithographic systems.
Collaborations
Throughout his career, Johnson has collaborated with talented individuals such as Benjamin Sams and Dietmar Uwe Herbert Trees. These collaborations have fostered an environment of innovation and creativity, contributing to the success of their projects.
Conclusion
Brandon Michael Johnson's contributions to droplet generation technology are noteworthy and impactful. His patents and work at ASML Netherlands B.V. highlight his role as an innovator in the field. Johnson's dedication to advancing technology continues to shape the future of lithographic systems.