This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Intel Corporation. Active years: 2005-2006.
Company Filing History:
Years Active: 2005-2006
Title: The Innovations of Borna Obradovic
Introduction
Borna Obradovic is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of buried insulator devices. With a total of 2 patents to his name, Obradovic's work focuses on enhancing device performance through innovative methods.
Latest Patents
Obradovic's latest patents include a "Method and structure to decrease area capacitance within a buried insulator device." This invention discloses a technique where a portion of the substrate layer of a buried insulator structure, opposite the insulator layer from the gate, is doped with the same doping polarity as the source and drain regions of the device. This approach aims to provide reduced area capacitance, which is crucial for improving device efficiency. The method may be limited to portions of the substrate that are not located beneath the gate, ensuring optimal performance.
Career Highlights
Borna Obradovic is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing. His role at Intel allows him to work on cutting-edge technologies that shape the future of electronics.
Collaborations
Throughout his career, Obradovic has collaborated with esteemed colleagues such as Mark Stettler and Martin D. Giles. These partnerships have fostered an environment of innovation and creativity, contributing to the success of their projects.
Conclusion
Borna Obradovic's contributions to the field of semiconductor technology through his patents and work at Intel Corporation highlight his role as a significant inventor. His innovative methods for reducing area capacitance in buried insulator devices demonstrate his commitment to advancing technology.