Company Filing History:
Years Active: 2008-2015
Title: The Innovative Contributions of Bin Hu
Introduction
Bin Hu is a prominent inventor based in Portland, OR (US), known for his significant contributions to the field of photolithography. With a total of 8 patents to his name, he has made remarkable advancements in mask design and semiconductor manufacturing processes.
Latest Patents
Among his latest patents, one notable invention is focused on mask layout patterns for closely spaced primitives in phase shift photolithography masks. This innovation describes improved mask layout patterns that enhance the accuracy of photolithography processes. In this patent, a portion of a photolithography mask layout is decomposed into primitives, and jogs are identified from these primitives, characterized by three adjacent corners. E-fields are determined for the identified jogs, which are then applied to synthesize an electric field at a substrate. The mask layout is subsequently corrected using the synthesized electric field, leading to a calculated printed wafer pattern.
Another significant patent by Bin Hu involves mask design and optical proximity correction (OPC) for device manufacture. This invention outlines a method for designing and modeling a set of masks that are successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. The patent also describes a method of double patterning a substrate with the set of masks and correcting a drawn pattern based on predicted pattern contours of other mask levels.
Career Highlights
Bin Hu is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in semiconductor technology. His work has been instrumental in enhancing the efficiency and precision of photolithography processes, which are critical in the manufacturing of advanced electronic devices.
Collaborations
Throughout his career, Bin Hu has collaborated with notable colleagues, including Vivek K Singh and Sungwon Kim. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in the field.
Conclusion
Bin Hu's contributions to the field of photolithography and semiconductor manufacturing are noteworthy. His innovative patents and ongoing work at Intel Corporation highlight his role as a leading inventor in the industry.