The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7603648 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 13, 2009

Filed:

Jun. 29, 2005
Applicants:

Peng Liu, Sunnyvale, CA (US);

Vivek Singh, Portland, OR (US);

Bin HU, Portland, OR (US);

Inventors:

Peng Liu, Sunnyvale, CA (US);

Vivek Singh, Portland, OR (US);

Bin Hu, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.


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