Bin-chang Chang

Title: Innovations of Bin-chang Chang

Introduction

Bin-chang Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the semiconductor industry. With a total of 2 patents, his work has advanced the technology used in mask repair and fabrication.

Latest Patents

Chang's latest patents include "Repair of photolithography masks by sub-wavelength artificial grating technology." This method involves repairing mask damage defects by determining the topographical information of a defect and using optical simulations to create grating repair specifications. Additionally, he holds a patent for "Multi-step phase shift mask and methods for fabrication thereof." This invention features a phase shift mask with a transparent substrate and a patterned opaque material layer, enhancing optical performance through a self-aligned fabrication method.

Career Highlights

Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in improving the efficiency and effectiveness of photolithography processes.

Collaborations

Some of his notable coworkers include Ming Huei Lu and King-chang Shu, who have collaborated with him on various projects within the company.

Conclusion

Bin-chang Chang's innovative contributions to photolithography technology have made a significant impact in the semiconductor field. His patents reflect his expertise and commitment to advancing this critical area of technology.