The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Mar. 26, 2004
Applicants:
Ming LU, Sijhih, TW;
King-chang Shu, Hsin-Chu, TW;
Bin-chang Chang, Hsin-Chu, TW;
Li-wei Kung, Hsin-Chu, TW;
Inventors:
Ming Lu, Sijhih, TW;
King-chang Shu, Hsin-Chu, TW;
Bin-chang Chang, Hsin-Chu, TW;
Li-wei Kung, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 1/14 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is disclosed for repairing mask damage defects. After determining topographical information of a defect on a mask, one or more grating repair specifications are determined based on an optical simulation using the topographical information. One or more artificial grating areas are formed on one or more sides of the defect based on the grating repair specification.