Taiwan Semiconductor Manufacturing Comp. Ltd.

Bin-chang Chang

Ming Huei Lu

Li-Wei Kung

Li-wei Kung

King-chang Shu

A method is disclosed for repairing mask damage defects. After determining topographical information of a defect on a mask, one or more grating repair specifications are determined based on an optical simulation using the topographical information. One or more artificial grating areas are formed on one or more sides of the defect based on the grating repair specification.

Repair of photolithography masks by sub-wavelength artificial grating technology

A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.

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Hsin-Chu, Taiwan

Bin-chang Chang