Boulogne-Billancourt, France

Bertrand Plainchamp


 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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2 patents (USPTO):Explore Patents

Title: The Innovations of Bertrand Plainchamp

Introduction

Bertrand Plainchamp is a notable inventor based in Boulogne-Billancourt, France. He has made significant contributions to the field of photolithography, holding a total of 2 patents. His work focuses on enhancing the efficiency and precision of photolithographic devices.

Latest Patents

Plainchamp's latest patents include a "Photolithographic illuminator device enabling controlled diffraction." This invention features a light beam source, a condenser, and an optical homogenizing system that includes at least one microlens array. The system is designed to improve the performance of photolithographic devices by incorporating a network of aperture diaphragms arranged in the Fourier transform plane of the shutter plane. Another significant patent is the "Photolithographic illuminator that is telecentric in two directions." This device also includes a light beam source and a condenser, with an optical homogenizing system that utilizes two microlens arrays. The design ensures merged image and object focal planes in two orthogonal directions, enhancing the overall functionality of photolithographic devices.

Career Highlights

Throughout his career, Bertrand Plainchamp has worked with prominent companies such as Sagem Defense Sécurité and Shanghai Micro Electronics Equipment Co., Ltd. His experience in these organizations has contributed to his expertise in the field of photolithography.

Collaborations

One of his notable collaborators is Renaud Mercier Ythier. Their partnership has likely fostered innovative ideas and advancements in their shared field of expertise.

Conclusion

Bertrand Plainchamp's contributions to photolithography through his patents and career experiences highlight his role as a significant inventor in this technological domain. His work continues to influence advancements in photolithographic devices.

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