The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2018
Filed:
Sep. 25, 2013
Sagem Defense Securite, Boulogne-Billancourt, FR;
Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;
Bertrand Plainchamp, Boulogne-Billancourt, FR;
Renaud Mercier Ythier, Boulogne-Billancourt, FR;
SAGEM DEFENSE SECURITE, Boulogne-Billancourt, FR;
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD., Shanghai, CN;
Abstract
The invention relates to a photolithographic illumination device including: a light beam source; a condenser (); an optical homogenizing system (), including at least one microlens array (L, L), arranged upstream from the condenser () such that the image focal plane of the optical homogenizing system is positioned in the object focal plane of the condenser; a shutter (), arranged in the object focal plane of the optical homogenizing system, and in which the optical homogenizing system includes two microlens arrays (L, L), the spacing as well as the arrangement and orientation of the microlenses of which are designed such that, in two directions (X, Y) orthogonal to the optical axis, the optical homogenizing system has merged image focal planes and merged object focal planes. The invention likewise relates to a photolithographic device including such an illuminator.