The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Sep. 25, 2013
Applicants:

Sagem Defense Securite, Boulogne-Billancourt, FR;

Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;

Inventors:

Bertrand Plainchamp, Boulogne-Billancourt, FR;

Renaud Mercier Ythier, Boulogne-Billancourt, FR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03F 7/20 (2006.01); G02B 27/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70075 (2013.01); G02B 27/0927 (2013.01); G02B 27/0961 (2013.01); G03F 7/70066 (2013.01);
Abstract

The invention relates to a photolithographic illuminator device including: a light beam source, a condenser (), an optical homogenizing system () including at least one microlens array, said system being arranged upstream from the condenser, and a shutter () arranged at the object focal point of the optical homogenizing system, the illuminator being characterized in that same further comprises a network of aperture diaphragms () arranged in the Fourier transform plane of the shutter plane (). The invention likewise relates to a photolithographic device including such an illuminator.


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