Hanau, Germany

Berthold Ocker

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 1996-2022

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8 patents (USPTO):Explore Patents

Title: Berthold Ocker: Innovator in Coating Technologies

Introduction

Berthold Ocker is a notable inventor based in Hanau, Germany. He has made significant contributions to the field of coating technologies, holding a total of eight patents. His innovative methods have advanced the way substrates are treated and coated in various industrial applications.

Latest Patents

Among his latest patents, Ocker has developed a "Method of Coating Substrates," which focuses on determining a velocity profile for the movement of a substrate relative to a coating source. This method enhances the efficiency and effectiveness of the coating process. Another significant patent is the "Method and System for Naturally Oxidizing a Substrate." This invention involves a system for treating a substrate within a reaction chamber, utilizing a transfer chamber to ensure optimal conditions for substrate treatment. The process includes controlling the pressure and temperature of the gaseous atmosphere to match that of the reaction chamber, thereby improving the quality of the treatment.

Career Highlights

Throughout his career, Berthold Ocker has worked with prominent companies such as Singulus Technologies AG and Leybold Aktiengesellschaft. His experience in these organizations has allowed him to refine his expertise in coating technologies and contribute to various innovative projects.

Collaborations

Ocker has collaborated with notable professionals in his field, including Wolfram Maass and Mark Saunders. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Berthold Ocker's contributions to coating technologies through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the industry and improve substrate treatment processes.

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