Bernd Schulz

Title: Bernd Schulz: Innovator in Overlay Accuracy Technologies

Introduction

Bernd Schulz is a prominent inventor based in Radebeul, Germany. He has made significant contributions to the field of overlay accuracy technologies, holding a total of 9 patents. His work focuses on enhancing alignment control systems, which are crucial in various high-tech manufacturing processes.

Latest Patents

One of his latest patents is titled "Method and system for reducing overlay errors within exposure fields by APC control strategies." This invention takes into account tool-specific distortion signatures and reticle-specific placement characteristics to improve the control quality of advanced APC strategies. The correction data generated can be tailored based on combinations of tools, reticles, and layers, thereby modifying the target values of alignment parameters used in the alignment process.

Another notable patent is "Structure and method for determining an overlay accuracy." This technique involves an overlay target assembly with at least two targets, each containing a first sub-structure of a first layer and a second sub-structure of a second layer. When aligned correctly, these structures can determine overlay errors without the need for calibration, enhancing the accuracy of alignment processes.

Career Highlights

Throughout his career, Bernd Schulz has worked with leading companies in the semiconductor industry, including Advanced Micro Devices Corporation and Globalfoundries Inc. His expertise in overlay accuracy has made him a valuable asset in these organizations, contributing to advancements in manufacturing technologies.

Collaborations

He has collaborated with notable professionals in his field, including Rolf Seltmann and Fritjof Hempel. These collaborations have further enriched his work and contributed to the development of innovative solutions in overlay accuracy.

Conclusion

Bernd Schulz's contributions to the field of overlay accuracy technologies are significant and impactful. His innovative patents and collaborations with industry leaders highlight his role as a key figure in advancing manufacturing processes. His work continues to influence the semiconductor industry and improve alignment control systems.