The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Apr. 29, 2002
Bernd Schulz, Radebeul, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
A semiconductor structure and a method of determining an overlay error produced during formation of the semiconductor structure are disclosed. The semiconductor structure comprises a first two-dimensional periodic pattern and a second two-dimensional periodic pattern, which overlap with each other, wherein a relative position between the overlapping first and second two-dimensional periodic patterns indicates the magnitude and direction of an overlay error caused during the formation of the first and second two-dimensional periodic patterns. The semiconductor allows one to independently determine the overlay errors in linearly independent directions by directing a light beam of known optical properties onto the first and second two-dimensional periodic patterns and by analyzing the diffracted beam by comparison with reference data.