Bernard W Ho

Title: Bernard W. Ho: Innovator in Semiconductor Technology

Introduction

Bernard W. Ho is a notable inventor based in Fremont, CA, who has made significant contributions to the field of semiconductor technology. With a total of 4 patents to his name, he has developed innovative methods that enhance the manufacturing processes of integrated circuits.

Latest Patents

Among his latest patents, one notable invention is a method for making electrical contact through an opening of one micron or less. This method involves creating an insulating layer structure over semiconductor device structures and forming a resist mask with substantially vertical sided openings. The process includes isotropically and anisotropically etching the insulating layer to create openings that allow for electrical contact with device elements. Another significant patent focuses on low P+ contact resistance formation by double implant, which improves the manufacturing of PMOS integrated circuits. This method results in lower contact resistance and higher speed for CMOS integrated circuits while maintaining minimal manufacturing costs.

Career Highlights

Throughout his career, Bernard has worked with prominent companies in the semiconductor industry, including Advanced Micro Devices Corporation and Chartered Semiconductor Manufacturing Ltd. His work has been instrumental in advancing technologies that are critical to modern electronics.

Collaborations

Bernard has collaborated with several professionals in the field, including Robin W. Cheung and Hsiang-Wen Chen. These collaborations have contributed to the successful development of his innovative technologies.

Conclusion

Bernard W. Ho's contributions to semiconductor technology through his patents and career achievements highlight his role as a key innovator in the industry. His work continues to influence the development of advanced integrated circuits.