Company Filing History:
Years Active: 2015-2025
Title: Innovations of Bernard Lloyd Hwang
Introduction
Bernard Lloyd Hwang is a prominent inventor based in Santa Clara, California. He has made significant contributions to the field of integrated circuits, holding a total of 17 patents. His work focuses on improving the efficiency and effectiveness of substrate processing in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Film thickness uniformity improvement using edge ring and bias electrode geometry." This invention relates to the fabrication of integrated circuits and aims to enhance film thickness uniformity within a substrate processing chamber. The embodiment of this patent includes an innovative edge ring design, which features an overhang ring to optimize performance.
Career Highlights
Bernard Hwang has built a successful career at Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in the field has led to numerous advancements in technology and manufacturing processes.
Collaborations
Throughout his career, Bernard has collaborated with notable colleagues, including Malcolm J Bevan and Lara Hawrylchak. These partnerships have contributed to the development of groundbreaking technologies in the semiconductor sector.
Conclusion
Bernard Lloyd Hwang's contributions to the field of integrated circuits and his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the semiconductor industry and improve manufacturing processes.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.